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Quasi-Reversible Interaction of MPS and Chloride on Cu(100) Studied by In Situ STM

Type of publication Peer-reviewed
Publikationsform Original article (peer-reviewed)
Publication date 2013
Author Huynh T. M. T., Hai N. T. M., Broekmann P.,
Project New concepts for the 3D-TSV electroplating: From the tailored design to the application of suppressor additives
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Original article (peer-reviewed)

Journal Journal of The Electrochemical Society
Volume (Issue) 160(12)
Page(s) 3063 - 3069
Title of proceedings Journal of The Electrochemical Society
DOI 10.1149/2.012312jes


We studied the competitive chloride/MPS adsorption on Cu(100) by means of in situ STM. MPS (mercaptopropane sulfonic acid) spontaneously forms on the bare metallic copper surface by dissociative adsorption of SPS (bis-(3-sulfopropyl)disulfide). MPS self-assembles on Cu(100) giving rise to the formation of a c(2 × 6)-MPS adlayer with a nominal surface coverage of θ = 0.33 ML. Subsequent chloride co-adsorption from a mixed Cl/SPS containing electrolyte leads to the reorganization of the surface structure. The resulting co-adsorption phase can be rationalized in terms of a defect-rich c(2 × 2)-MPS/Cl adlayer with a nominal surface coverages of θCl = 0.25 ML and θMPS = 0.25 ML. In the STM experiment visible, however, is a pattern with p(2 × 2) symmetry that corresponds to the terminating layer of sulfonate head groups of the MPS sub-lattice in the c(2 × 2)-MPS/Cl co-adsorption phase.The particular ratio of the MPS/Cl surface concentrations is proven to be dependent on the ratio of the SPS/Cl concentrations in the bulk solution. The present STM work demonstrates quasi-reversibility in the MPS/Cl surface phase behavior.