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Extreme ultraviolet lasers: principles and potential for next-generation lithography

Type of publication Peer-reviewed
Publikationsform Review article (peer-reviewed)
Publication date 2012
Author Balmer Jürg, Bleiner Davide, Staub Felix,
Project "ELAN" - EUV Laser for Actinic Nano-imaging.
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Review article (peer-reviewed)

Journal Journal of Micro/Nanolithography, MEMS, and MOEMS.
Volume (Issue) 11(2)
Page(s) 021119 - 3
Title of proceedings Journal of Micro/Nanolithography, MEMS, and MOEMS.
DOI 10.1117/1.JMM.11.2.021119

Abstract

Extreme ultraviolet (EUV) lasers in the wavelength range of ∼10 to 20 nm have matured to a point where dedicated applications such as at-wavelength inspection of extreme-ultraviolet lithography (EUVL) masks become possible on the laboratory scale. The authors briefly review the principles of plasma-based EUV lasers, the progress made so far, and the output characteristics of interest to the EUVL community.
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