Back to overview

Plasmonic Films Can Easily Be Better: Rules and Recipes

Type of publication Peer-reviewed
Publikationsform Original article (peer-reviewed)
Author McPeak Kevin M., Jayanti Sriharsha V., Kress Stephan J. P., Meyer Stefan, Iotti Stelio, Rossinelli Aurelio, Norris David J.,
Project Electronic Impurity Doping of Semiconductor Nanocrystals
Show all

Original article (peer-reviewed)

Journal ACS Photonics
Volume (Issue) 2(3)
Page(s) 326 - 333
Title of proceedings ACS Photonics
DOI 10.1021/ph5004237

Open Access

Type of Open Access Publisher (Gold Open Access)


High-quality materials are critical for advances in plasmonics, especially as researchers now investigate quantum effects at the limit of single surface plasmons or exploit ultraviolet- or CMOS-compatible metals such as aluminum or copper. Unfortunately, due to inexperience with deposition methods, many plasmonics researchers deposit metals under the wrong conditions, severely limiting performance unnecessarily. This is then compounded as others follow their published procedures. In this perspective, we describe simple rules collected from the surface-science literature that allow high-quality plasmonic films of aluminum, copper, gold, and silver to be easily deposited with commonly available equipment (a thermal evaporator). Recipes are also provided so that films with optimal optical properties can be routinely obtained.