scanning probe; ion mass spectroscopy; 3D capability; pattern transfer; nanolithography; local material desorption
Lisunova Yuliya (2017), High-aspect ratio nanopatterning via combined thermal scanning probe lithography and dry etching, in Microelectronic Engineering
The NanoFrazor equipment from SwissLitho AG is a new nanolithography tool based on heated AFM probes. The locally induced heat from a nano-tip desorbs a specifically designed resist material and allows for 2D as well as 3D surface patterns. No additional development and/or baking steps are needed, and the resist nanostructure can be transferred into the underlying material by plasma etching method. It would yet be shortsighted to consider the NanoFrazor only as general-purpose nano-lithography tool to replace electron-beam lithography tasks. Several unique assets make the NanoFrazor particularly interesting for advanced research in nanotechnology. Several research groups at EPFL have teamed up to explore the possibilities of this new instrument and to gain added value to existing research and to perform completely new studies that were impossible so far due to the lack of capabilities that now the NanoFrazor offers. These research projects include for instance the fabrication of molds for nanoimprint lithography, nanopatterning on dielectric thin films (otherwise difficult with charge electron beam lithography), creating 3D pit niches for bacteria and cell placement for bio-AFM studies, local heat induced ligand removal of nanoparticles to create rectennae, heat induced desorption and ion specific analysis of material at nm resolution, etc.