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Nanostencil Lithography: Perfecting the Tool towards Selected Applications

English title Nanostencil Lithography: Perfecting the Tool towards Selected Applications
Applicant Savu Veronica
Number 139505
Funding scheme Ambizione
Research institution Departement Physik Universität Basel
Institution of higher education University of Basel - BS
Main discipline Microelectronics. Optoelectronics
Start/End 01.02.2012 - 31.01.2014
Approved amount 304'288.00
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All Disciplines (2)

Discipline
Microelectronics. Optoelectronics
Condensed Matter Physics

Keywords (3)

stencil lithography; electronic applications; parallel nanopatterning

Lay Summary (English)

Lead
Lay summary
Stencil lithography allows a wide variety of materials (organics, self-assembled monolayers) and substrates (flexible, functionalized, topographically-rich) incompatible with most standard techniques to be patterned. 

The current proposal’s thrust is two-fold: a comprehensive characterization of the self-cleaning stencil and its effects on the fabricated structures, together with patterning of static and dynamic stencil-enabled devices and an in-depth measurement of their properties.

Several applications using stencils (dynamic/static/self-cleaning) are envisioned: integration of graphene and other 2D electronic materials with stencil (patterning and/or electrode deposition), and 1D objects (either pre-existent on substrates or patterned in-situ) contacted with stencil lithography, catalyst deposition through nano-apertures on inclined or vertical walls for horizontal nanowire/nanotube growth, and CMOS-integrated sensors with real-time detection of material evaporation.













Direct link to Lay Summary Last update: 21.02.2013

Responsible applicant and co-applicants

Employees

Publications

Publication
Application of stencil masks for ion beam lithographic patterning
Brun S., Savu V., Schintke S., Guibert E., Keppner H., Brugger J., Whitlow H. J. (2013), Application of stencil masks for ion beam lithographic patterning, in NUCLEAR INSTR. & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 306, 292-295.
Resistless Fabrication of Nanoimprint Lithography (NIL) Stamps Using Nano-Stencil Lithography
Villanueva Luis Guillermo, Vazquez-Mena Oscar, Martin-Olmos Cristina, Savu Veronica, Sidler Katrin, Brugger Juergen (2013), Resistless Fabrication of Nanoimprint Lithography (NIL) Stamps Using Nano-Stencil Lithography, in MICROMACHINES, 4(4), 370-377.
All-stencil transistor fabrication on 3D silicon substrates
Villanueva L. G., Vazquez-Mena O., Martin-Olmos C., Savu V., Sidler K., Montserrat J., Langlet P., Hibert C., Vettiger P., Bausells J., Brugger J. (2012), All-stencil transistor fabrication on 3D silicon substrates, in JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 22(9), 059022-059027.
CAFM investigations of filamentary conduction in Cu2O ReRAM devices fabricated using stencil lithography technique
Singh Bharti, Mehta B. R., Varandani Deepak, Savu Andreea Veronica, Brugger Juergen (2012), CAFM investigations of filamentary conduction in Cu2O ReRAM devices fabricated using stencil lithography technique, in NANOTECHNOLOGY, 23(49), 495707-495716.
Compliant membranes improve resolution in full-wafer micro/nanostencil lithography
Sidler Katrin, Villanueva Luis G., Vazquez-Mena Oscar, Savu Veronica, Brugger Juergen (2012), Compliant membranes improve resolution in full-wafer micro/nanostencil lithography, in NANOSCALE, 4(3), 773-778.
Effects of tensile stress on electrical parameters of thin film conductive wires fabricated on a flexible substrate using stencil lithography
Frantlovic Milos, Jokic Ivana, Savu Veronica, Xie Shenqi, Brugger Juergen (2012), Effects of tensile stress on electrical parameters of thin film conductive wires fabricated on a flexible substrate using stencil lithography, in MICROELECTRONIC ENGINEERING, 98, 230-233.
High-Resolution Resistless Nanopatterning on Polymer and Flexible Substrates for Plasmonic Biosensing Using Stencil Masks
Vazquez-Mena Oscar, Sannomiya Takumi, Tosun Mahmut, Villanueva Luis G., Savu Veronica, Voros Janos, Brugger Juergen (2012), High-Resolution Resistless Nanopatterning on Polymer and Flexible Substrates for Plasmonic Biosensing Using Stencil Masks, in ACS NANO, 6(6), 5474-5481.
Organic half-wave rectifier fabricated by stencil lithography on flexible substrate
Cvetkovic Nenad V., Sidler Katrin, Savu Veronica, Brugger Juergen, Tsamados Dimitrios, Ionescu Adrian M. (2012), Organic half-wave rectifier fabricated by stencil lithography on flexible substrate, in MICROELECTRONIC ENGINEERING, 100, 47-50.
Stencil-nanopatterned back reflectors for thin-film amorphous silicon n-i-p solar cells
Pahud Celine, Savu Veronica, Klein Mona, Vazquez-Mena Oscar, Soederstroem Karin, Haug Franz-Josef, Brugger Juergen, Ballif Christophe (2012), Stencil-nanopatterned back reflectors for thin-film amorphous silicon n-i-p solar cells, in 2012 38TH IEEE PHOTOVOLTAIC SPECIALISTS CONFERENCE (PVSC), 000694-000696.
Streched organic transistors maintain mobility on flexible substrates
Sidler Katrin, Cvetkovic Nenad V., Tsamados Dimitrios, Ionescu Adrian M., Brugger Juergen, Savu Veronica (2012), Streched organic transistors maintain mobility on flexible substrates, in MICROELECTRONIC ENGINEERING, 98, 508-511.
Vertically-stacked gate-all-around polysilicon nanowire FETs with sub-mu m gates patterned by nanostencil lithography
Sacchetto Davide, Xie Shenqi, Savu Veronica, Zervas Michael, De Micheli Giovanni, Brugger Juergen, Leblebici Yusuf (2012), Vertically-stacked gate-all-around polysilicon nanowire FETs with sub-mu m gates patterned by nanostencil lithography, in MICROELECTRONIC ENGINEERING, 98, 355-358.

Collaboration

Group / person Country
Types of collaboration
Indian Institue of Technology Delhi India (Asia)
- in-depth/constructive exchanges on approaches, methods or results
- Publication
3D-OXIDES France (Europe)
- Industry/business/other use-inspired collaboration
Microelectronic Systems Laboratory, EPFL Switzerland (Europe)
- in-depth/constructive exchanges on approaches, methods or results
- Publication
- Research Infrastructure
Quantum Coherence Lab, Univ. of Basel Switzerland (Europe)
- in-depth/constructive exchanges on approaches, methods or results
Nanolab, EPFL Switzerland (Europe)
- in-depth/constructive exchanges on approaches, methods or results
- Publication
PV-LAB, EPFL Switzerland (Europe)
- in-depth/constructive exchanges on approaches, methods or results
- Publication
Haute Ecole Arc Ingenierie Switzerland (Europe)
- in-depth/constructive exchanges on approaches, methods or results
- Publication

Scientific events

Active participation

Title Type of contribution Title of article or contribution Date Place Persons involved
The 57th international conference on electron, ion, and photon beam technology and nanofabrication Talk given at a conference Morphological characterization of metallic nanostructures evaporated through stencil on graphene 28.05.2013 Nashville, United States of America Savu Veronica;
Swiss Nanoconvention Poster Morphological characterization of metallic nanostructures evaporated through stencil on graphene 23.05.2013 Basel, Switzerland Savu Veronica;
38th international conference on micro and nano engineering Talk given at a conference Structured TiO2 deposited on Si through a stencil mask using Chemical Beam Epitaxy 16.09.2012 Toulouse, France Savu Veronica;
The 56th international conference on electron, ion, and photon beam technology and nanofabrication Poster Stencil-nanopatterned back-reflector increases efficiency of thin-film solar-cells 29.05.2012 Hawaii, United States of America Savu Veronica;


Use-inspired outputs


Start-ups

Name Year

Associated projects

Number Title Start Funding scheme
150776 Nano-Frazor 01.01.2014 R'EQUIP
121923 Full-Wafer Dynamic Nanostencil Lithography 01.12.2008 Ambizione
121923 Full-Wafer Dynamic Nanostencil Lithography 01.12.2008 Ambizione

Abstract

An in-situ self-cleaning approach will be integrated with full-wafer dynamic stencil lithography for the fabrication of multi-material, variable-thickness custom structures. The elimination of aperture clogging in real time will make nano-patterning viable - the limits of this technique (in terms of resolution, registration, possible materials) will be investigated. In parallel, static stencils will be used in a variety of applications, such as contacts to sensitive materials (e.g. graphene, nanowires/nanotubes) and sub-micrometer patterning on top of 3D topographies (e.g nano-catalysts for 1D structure growth on vertical walls, gate contact on vertical stacks of nanowire transistors).
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