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Surface structuring by means of stimulated desorption of organic material

Titel Englisch Surface structuring by means of stimulated desorption of organic material
Gesuchsteller/in Knoll Armin
Nummer 126905
Förderungsinstrument Projektförderung (Abt. I-III)
Forschungseinrichtung IBM Research GmbH
Hochschule Firmen/Privatwirtschaft - FP
Hauptdisziplin Andere Gebiete der Physik
Beginn/Ende 01.11.2009 - 31.10.2012
Bewilligter Betrag 180'414.00
Alle Daten anzeigen

Alle Disziplinen (2)

Disziplin
Andere Gebiete der Physik
Materialwissenschaften

Keywords (8)

Nanotechnology; Lithography; 3-dimensional Patterning; Guided Assembly; Scanning Probe Lithography; Polymeric Materials; Stimuli-Responsive Materials; Patterning

Lay Summary (Englisch)

Lead
Lay summary
Structuring of surfaces is at the heart of nano-technology and CMOS-electronics. The quest to continue with Moore's scaling is fueled by the economic advantages of integrating more functionality on a given Si footprint and the performance gain that can be achieved by using overall smaller devices. On the other hand, huge technological problems need to be solved in the not too distant future with regard to the lithographic methods that will be used for making the devices. According to the roadmap, high throughput lithography will have to cope with a 20nm feature size in 2017. It is not clear at all, whether optical lithography can be extended towards this scale. Alternatively, electron beam lithography (EBL) is a well established high-resolution technology but it suffers from high cost and through-put problems, in particular writing speeds scale over-proportionally poorly at small scales. As another alternative, nano-imprint lithography (NIL) has attracted substantial attention more recently. It has been proposed to use the technology for FLASH memory production in the near future. However, NIL requires to-scale fabrication of masters and hence does not solve the fundamental lithographic problem. However, it provides a bridge for closing the gap between slow sequential high resolution lithography and large scale mass production.In this proposal we address the fundamental lithographic problem of inscribing patterns in organic materials with nano-meter precision using scanning probe methods. Recently, we discovered that virtually any arbitrarily shaped structure can be engraved in low molecular weight glasses using a hot tip. The structure is defined by a pixel set. At each pixel, a force and temperature stimulus is applied to the probe tip which then induces the evaporation of a controlled amount of organic material. The amount of material and thus the depth and radius of the pixel depend on the applied tip force, the tip temperature and the duration of the stimulus. At the end of the exposure the pixel map has been translated into a topographic image whereby the organic material is thinned down by a well defined distance at each pixel position. The interesting feature of the process is that no post development is needed. The finished pattern is obtained in the writing step. Direct inspection of the writing can be performed in situ and corrective measures can be applied if necessary on the fly. Furthermore, patterning speeds on the order of ms per pixel can be achieved. Thus the proposed project brings e-beam like patterning capabilities within reach of an ordinary probe microscopy system.
Direktlink auf Lay Summary Letzte Aktualisierung: 21.02.2013

Verantw. Gesuchsteller/in und weitere Gesuchstellende

Mitarbeitende

Name Institut

Publikationen

Publikation
Thermal probe mask-less lithography for 27.5 nm half-pitch Si technology
(2013), Thermal probe mask-less lithography for 27.5 nm half-pitch Si technology, in Nano Letters, 13, 4485.
Thermal probe nanolithography: in-situ inspection, high-speed, high-resolution, 3D
(2013), Thermal probe nanolithography: in-situ inspection, high-speed, high-resolution, 3D, in Proceedings SPIE, 8886, 888605-9.
Rapid turnaround scanning probe nanolithography
(2012), Rapid turnaround scanning probe nanolithography, in Nanotechnology, 22, 275306.
Directed Placement of Gold Nanorods Using a Removable Template for Guided Assembly
(2011), Directed Placement of Gold Nanorods Using a Removable Template for Guided Assembly, in Nano Letters, 11(9), 3957-3962.
Field stitching in thermal probe lithography by means of surface roughness correlation
(2011), Field stitching in thermal probe lithography by means of surface roughness correlation, in Nanotechnology, 23, 385307.
High density multi-level recording for archival data preservation
(2011), High density multi-level recording for archival data preservation, in APPLIED PHYSICS LETTERS, 99(2), 023110.

Wissenschaftliche Veranstaltungen

Aktiver Beitrag

Titel Art des Beitrags Titel des Artikels oder Beitrages Datum Ort Beteiligte Personen
AVS 59th Int'l Symp. and Exhibition Vortrag im Rahmen einer Tagung Fast Turnaround 3D Nanolithography using Heated Probes - From Nanofabrication to Directed Assembly 28.10.2012 Tampa, FL, USA, Vereinigte Staaten von Amerika Knoll Armin; Holzner Felix; Dürig Urs;
38th Int'l Conf. on Micro and Nano Engineering "MNE" Vortrag im Rahmen einer Tagung Nano-Meter Accurate Positioning for Stitching Write Fields in Probe-Based Lithography 16.09.2012 Toulouse, Frankreich Holzner Felix; Dürig Urs; Knoll Armin;
The 56th Int'l Conf. on Electron, Ion, and Photon Beam Technology, and Nanofabrication "EIPBN 2012," Vortrag im Rahmen einer Tagung Probe Nanopatterning: Towards a Smarter Lithography Technology 29.05.2012 Waikoloa, Vereinigte Staaten von Amerika Knoll Armin; Dürig Urs; Holzner Felix;
MRS Spring Meeting 2012: Symp. AAA Vortrag im Rahmen einer Tagung Directed Placement of Gold Nanorods using Removable Assembly Guiding Structures 09.04.2012 San Francisco, CA, USA, Vereinigte Staaten von Amerika Knoll Armin; Spencer Nicholas D.; Holzner Felix; Dürig Urs;
DPG (German Physical Society) Spring Meeting 2012 Vortrag im Rahmen einer Tagung Thermal Scanning Probe Lithography: Progress and Applications 25.03.2012 Berlin, Deutschland Holzner Felix; Spencer Nicholas D.; Dürig Urs; Knoll Armin;
DPG (German Physical Society) Spring Meeting 2012 Vortrag im Rahmen einer Tagung Thermal Scanning Probe Lithography: Progress and Applications 25.03.2012 Berlin, Deutschland Knoll Armin; Holzner Felix; Spencer Nicholas D.; Dürig Urs;
3rd Int'l Workshop on Advanced Atomic Force Microscopy Techniques 2012 Vortrag im Rahmen einer Tagung Heated Probes on Polymers - From Nanofabrication to Directed Assembly 05.03.2012 KIT Karlsruhe, Deutschland Dürig Urs; Knoll Armin; Holzner Felix;
28th Annual Meeting of the Swiss Working Group on Surface and Interface Science "SAOG," Vortrag im Rahmen einer Tagung Direct Write 3-Dimensional Nanopatterning Using Polymers 27.01.2012 Fribourg, Schweiz Dürig Urs; Holzner Felix; Knoll Armin;
University College London Einzelvortrag Probe Nanopatterning: Toward a Smarter Lithography Technology 25.01.2012 London, Grossbritannien und Nordirland Dürig Urs; Holzner Felix; Knoll Armin;
MRS Directed Self-Assembly of Materials Workshop Vortrag im Rahmen einer Tagung Directed Placement of Gold Nanorods using Removable Assembly Guiding Structures 28.09.2011 Nashville, TN, USA, Vereinigte Staaten von Amerika Spencer Nicholas D.; Dürig Urs; Knoll Armin; Holzner Felix;
Euro AFM Forum 2011 Vortrag im Rahmen einer Tagung Thermal Scanning Probe Lithography at IBM Research 07.09.2011 Zuerich, Schweiz Dürig Urs; Knoll Armin; Holzner Felix; Spencer Nicholas D.;
DPG (German Physical Society) Spring Meeting 2011 Vortrag im Rahmen einer Tagung Probe-based thermomechanical direct-writing 13.03.2011 Dresden, Deutschland Knoll Armin; Dürig Urs; Holzner Felix;


Selber organisiert

Titel Datum Ort

Auszeichnungen

Titel Jahr
ETH Pioneer Fellowship 2012
Venture Best Business Idea 2012
Venturekick I 2012
Venturekick I 2012
Image contest winner, EURO AFM Forum 2011
Venturekick I 2011

Patente

Titel Datum Nummer Erfinder Eigentümer
Multiscale patterning of a sample with apparatus having both thermo-optical lithography capability and thermal scanning probe lithography capability 19.12.2013 WO 2015092570 A1
METHODS AND APPARATUSES FOR POSITIONING NANO-OBJECTS WITH ASPECT RATIOS 30.04.2012 WO2013164741 A1
ACCURATE DEPOSITION OF NANO-OBJECTS ON A SURFACE 29.04.2011 US8821965 B2
SCANNING PROBE MICROSCOPY CANTILEVER COMPRISING AN ELECTROMAGNETIC SENSOR 11.08.2011 DE102012214181 A1

Anwendungsorientierte Outputs


Start-ups

Name Jahr
SwissLitho AG 2012

Verbundene Projekte

Nummer Titel Start Förderungsinstrument
134777 Nanoscale thermal and electrical characterization 01.05.2011 Projektförderung (Abt. I-III)
144464 Study of the coupling efficiency of single nano-objects to highly confined optical fields in novel microcavity designs 01.03.2013 Projektförderung (Abt. I-III)

Abstract

Structuring of surfaces is at the heart of nano-technology and CMOS-electronics. The quest to continue with Moore’s scaling is fueled by the economic advantages of integrating more func-tionality on a given Si footprint and the performance gain that can be achieved by using overall smaller devices. On the other hand, huge technological problems need to be solved in the not too distant future with regard to the lithographic methods that will be used for making the de-vices. According to the roadmap, high throughput lithography will have to cope with a 20nm feature size in 2017. It is not clear at all, whether optical lithography can be extended towards this scale. Alternatively, electron beam lithography (EBL) is a well established high-resolution technology but it suffers from high cost and through-put problems, in particular writing speeds scale over-proportionally poorly at small scales. As another alternative, nano-imprint lithogra-phy (NIL) has attracted substantial attention more recently. It has been proposed to use the technology for FLASH memory production in the near future. However, NIL requires to-scale fabrication of masters and hence does not solve the fundamental lithographic problem. How-ever, it provides a bridge for closing the gap between slow sequential high resolution lithogra-phy and large scale mass production.In this proposal we address the fundamental lithographic problem of inscribing patterns in organic materials with nano-meter precision using scanning probe methods. Recently, we dis-covered that virtually any arbitrarily shaped structure can be engraved in low molecular weight glasses using a hot tip. The structure is defined by a pixel set. At each pixel, a force and tem-perature stimulus is applied to the probe tip which then induces the evaporation of a controlled amount of organic material. The amount of material and thus the depth and radius of the pixel depend on the applied tip force, the tip temperature and the duration of the stimulus. At the end of the exposure the pixel map has been translated into a topographic image whereby the organic material is thinned down by a well defined distance at each pixel position. The interest-ing feature of the process is that no post development is needed. The finished pattern is ob-tained in the writing step. Direct inspection of the writing can be performed in situ and correc-tive measures can be applied if necessary on the fly. Furthermore, patterning speeds on the order of ?s per pixel can be achieved. Thus the proposed project brings e-beam like patterning capabilities within reach of an ordinary probe microscopy system.The patterned organic material may serve as a 2-dimensional mask similar to a conventional photolithographic resist mask in standard Si processing. 300nm deep trenches separated by 30 nm wide walls have been produced in this way. As an additional important feature, one can also realize 3-dimensional structures by repeating the writing in previously written fields thereby removing another layer of the organic material. The resulting 3-dimensional structures can be used in their native state, for example as templates for replication. More interestingly, the 3-dimensional pattern can also be transferred into other materials by means of anisotropic ion etching whereby the etch selectivity actually provides an amplification mechanism for the depth scale. The work to be performed in this proposal addresses three fundamental issues:(1) Technological benchmarking and scaling limits: The goal is to understand the prospects and limitations of the technique. In particular, it is important to develop a thorough physical un-derstanding of the key processes involved. This forms the basis for directed research towards process optimization in the future.(2) Materials science: The initial experiments were done using a phenolic molecular glass with a molecular weight of 715 Da. According to our current thinking, hydrogen cross-linking due to the OH groups is the differentiator for thermo-dissociation patterning. Thus, the material selec-tion is wide open. From an application point of view, Si containing molecular glasses are par-ticularly interesting because of their etch specificity. Thermo-dissociation also works for spe-cifically tailored polymers as we have been able to demonstrate in the past two months. This opens up new perspectives by using block-copolymers for obtaining organic films with a high degree of order. We envisage that extreme resolution and patterning fidelity might be obtained in such ordered films.(3) Having gained a thorough understanding of the patterning capabilities, textured substrates for novel bottom-up approaches will be investigated. This work aims at closing the link towards guided self assembly, which is seen as a promising route for implementing radically new nano-technological schemes, in particular also in the life sciences. Here we specifically exploit the feature of extending the patterning capabilities to the third dimension.
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